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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Alternative Lithographic Technologies VI - Challenges for pattern formation with sub-100nm residual-layer thickness by roll-to-roll nanoimprint lithography

Resnick, Douglas J., Bencher, Christopher, Inanami, Ryoichi, Matsuki, Kazuto, Ojima, Tomoko, Kono, Takuya, Nakasugi, Tetsuro

Year:

2014

Language:

english

File:

PDF, 3.35 MB

english, 2014

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Sub-100 nm pattern formation by roll-to-roll nanoimprint

Inanami, Ryoichi, Ojima, Tomoko, Matsuki, Kazuto, Kono, Takuya, Nakasugi, Tetsuro, Tong, William M.

Year:

2012

Language:

english

File:

PDF, 5.41 MB

english, 2012

3

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - What is the strongest candidate in lithography for 2x nm HP and beyond?

Hashimoto, Kohji, Chen, Alek C., Lin, Burn, Yoneda, Ikuo, Koshiba, Takeshi, Yen, Anthony, Mikami, Shinji, Ota, Takumi, Ito, Masamitsu, Nakasugi, Tetsuro, Higashiki, Tatsuhiko

Year:

2008

Language:

english

File:

PDF, 3.75 MB

english, 2008

4

High Resolution Positive-Working Molecular Resist Derived from Truxene

Hattori, Shigeki, Yamada, Arisa, Saito, Satoshi, Asakawa, Koji, Koshiba, Takeshi, Nakasugi, Tetsuro

Journal:

Journal of Photopolymer Science and Technology

Year:

2009

Language:

english

File:

PDF, 606 KB

english, 2009

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Emerging Patterning Technologies - Study of nanoimprint lithography (NIL) for HVM of memory devices

Bencher, Christopher, Cheng, Joy Y., Kono, Takuya, Hatano, Masayuki, Tokue, Hiroshi, Kobayashi, Kei, Suzuki, Masato, Fukuhara, Kazuya, Asano, Masafumi, Nakasugi, Tetsuro, Choi, Eun Hyuk, Jung, Wooyung

Year:

2017

Language:

english

File:

PDF, 532 KB

english, 2017

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Emerging Patterning Technologies - The opportunity and challenge of spin coat based nanoimprint lithography

Bencher, Christopher, Cheng, Joy Y., Jung, Wooyung, Cho, Jungbin, Choi, Eunhyuk, Lim, Yonghyun, Bok, Cheolkyu, Tsuji, Masatoshi, Kobayashi, Kei, Kono, Takuya, Nakasugi, Tetsuro

Year:

2017

Language:

english

File:

PDF, 4.46 MB

english, 2017

7

Meniscus behavior under helium exposure for rapid resist spreading during nanoimprint lithography

Kashiwagi, Hiroyuki, Sato, Nobuyoshi, Hatano, Masayuki, Jung, Wooyung, Kono, Takuya, Nakasugi, Tetsuro

Journal:

Japanese Journal of Applied Physics

Year:

2018

Language:

english

File:

PDF, 5.33 MB

english, 2018

8

Novel electron beam resist material using hydrophilic protecting group

Satoshi Saito, Tetsuro Nakasugi

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 153 KB

english, 2005

9

Proximity Effect Correction For Electron Beam Lithography: Highly Accurate Correction Method

Kamikubo, Takashi, Abe, Takayuki, Oogi, Susumu, Anze, Hiroto, Shimizu, Mitsuko, Itoh, Masamitsu, Nakasugi, Tetsuro, Takigawa, Tadahiro, Iijima, Tomohiro, Hattori, Yoshiaki, Tojo, Toru

Journal:

Japanese Journal of Applied Physics

Year:

1997

File:

PDF, 880 KB

1997

10

Defect Inspection Technique Using Surface Plasmon Resonance

Kashiwagi, Hiroyuki, Yoneda, Ikuo, Morishita, Keiko, Yoshikawa, Ryoji, Hirano, Takashi, Nakasugi, Tetsuro

Journal:

Japanese Journal of Applied Physics

Year:

2012

Language:

english

File:

PDF, 367 KB

english, 2012

11

Charge-reducing Effect of Chemically Amplified Resist in Electron-Beam Lithography

Nakasugi, Tetsuro, Magoshi, Shunko, Sugihara, Kazuyoshi, Saito, Satoshi, Kihara, Naoko

Journal:

Japanese Journal of Applied Physics

Year:

1998

Language:

english

File:

PDF, 278 KB

english, 1998

12

Fabrication of Micro-Marks for Electron-Beam Lithography

Takamatsu, Jun, Nakasugi, Tetsuro, Kato, Yoshimitsu, Shimomura, Naoharu, Sunaoshi, Hitoshi, Hattori, Kiyoshi, Nakajima, Kazuaki, Sugihara, Kazuyoshi, Takigawa, Tadahiro

Journal:

Japanese Journal of Applied Physics

Year:

1997

File:

PDF, 1.84 MB

1997

13

Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-Match Lithography with 100 nm Resolution

Magoshi, Shunko, Niiyama, Hiromi, Sato, Shinji, Kato, Yoshimitsu, Watanabe, Yumi, Shibata, Tohru, Ito, Masamitsu, Ando, Atsushi, Nakasugi, Tetsuro, Sugihara, Kazuyoshi, Okumura, Katsuya

Journal:

Japanese Journal of Applied Physics

Year:

1999

Language:

english

File:

PDF, 250 KB

english, 1999

14

Optimization of a High-Performance Chemically Amplified Positive Resist for Electron-Beam Lithography

Nakasugi, Tetsuro, Tamura, Hitoshi, Niiyama, Hiromi, Saito, Satoshi, Kihara, Naoko, Naito, Takuya, Nakase, Makoto

Journal:

Japanese Journal of Applied Physics

Year:

1996

File:

PDF, 1.50 MB

1996

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - A study of filling process for UV nanoimprint lithography using a fluid simulation

Yoneda, Ikuo, Nakagawa, Yasutada, Mikami, Shinji, Tokue, Hiroshi, Ota, Takumi, Koshiba, Takeshi, Ito, Masamitsu, Hashimoto, Koji, Nakasugi, Tetsuro, Higashiki, Tatsuhiko, Schellenberg, Frank M., La Fo

Year:

2009

Language:

english

File:

PDF, 397 KB

english, 2009

16

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Novel molecular resist based on an amorphous truxene derivative

Hattori, Shigeki, Saito, Satoshi, Asakawa, Koji, Koshiba, Takeshi, Nakasugi, Tetsuro, Henderson, Clifford L.

Year:

2008

Language:

english

File:

PDF, 492 KB

english, 2008

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - High resolution positive-working molecular resist attached with alicyclic acid-leaving group

Yamada, Arisa, Hattori, Shigeki, Saito, Satoshi, Asakawa, Koji, Koshiba, Takeshi, Nakasugi, Tetsuro, Allen, Robert D.

Year:

2010

Language:

english

File:

PDF, 1.02 MB

english, 2010

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - NIL defect performance toward high volume mass production

Bencher, Christopher, Cheng, Joy Y., Hatano, Masayuki, Kobayashi, Kei, Kashiwagi, Hiroyuki, Tokue, Hiroshi, Kono, Takuya, Tetsuro, Nakasugi, Choi, Eun Hyuk, Jung, Wooyung

Year:

2016

Language:

english

File:

PDF, 852 KB

english, 2016

19

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Beam-monitoring system using microapertures for electron-beam lithography

Takamatsu, Jun, Shimomura, Naoharu, Sunaoshi, Hitoshi, Hattori, Kiyoshi, Ogasawara, Munehiro, Nakasugi, Tetsuro, Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 1.03 MB

english, 2000

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Study of nanoimprint lithography for applications toward 22nm node CMOS devices

Yoneda, Ikuo, Schellenberg, Frank M., Mikami, Shinji, Ota, Takumi, Koshiba, Takeshi, Ito, Masamitsu, Nakasugi, Tetsuro, Higashiki, Tatsuhiko

Year:

2008

Language:

english

File:

PDF, 1.20 MB

english, 2008

21

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Mask-induced aberration in EUV lithography

Nakajima, Yumi, Hosono, Kunihiro, Sato, Takashi, Inanami, Ryoichi, Nakasugi, Tetsuro, Higashiki, Tatsuhiko

Year:

2009

Language:

english

File:

PDF, 226 KB

english, 2009

22

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Effect of base additive on process latitude in chemically amplified electron-beam resists

Saito, Satoshi, Kihara, Naoko, Naito, Takuya, Nakase, Makoto, Nakasugi, Tetsuro, Kato, Yoshimitsu, Tarascon-Auriol, Regine G.

Year:

1997

Language:

english

File:

PDF, 281 KB

english, 1997

23

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture and the recent progress

Nakasugi, Tetsuro, Ando, Atsushi, Inanami, Ryoichi, Sasaki, Noriaki, Ota, Takumi, Nagano, Osamu, Yamazaki, Yuuichiro, Sugihara, Kazuyoshi, Mori, Ichiro, Miyoshi, Motosuke, Okumura, Katsuya, Miura, Aki

Year:

2003

Language:

english

File:

PDF, 831 KB

english, 2003

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Aberration budget in extreme ultraviolet lithography

Nakajima, Yumi, Schellenberg, Frank M., Sato, Takashi, Inanami, Ryoichi, Nakasugi, Tetsuro, Higashiki, Tatsuhiko

Year:

2008

Language:

english

File:

PDF, 340 KB

english, 2008

25

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Polar Correction: new overlay control method for higher-order intra-field error dependent on the wafer coordinates

Takakuwa, Manabu, Allgair, John A., Raymond, Christopher J., Toriumi, Keigo, Komine, Nobuhiro, Ishigo, Kazutaka, Kono, Takuya, Nakasugi, Tetsuro, Higashiki, Tatsuhiko

Year:

2009

Language:

english

File:

PDF, 614 KB

english, 2009

26

SPIE Proceedings [SPIE Photomask Japan '97 - Kawasaki City, Japan (Thursday 17 April 1997)] Photomask and X-Ray Mask Technology IV - Proximity effect correction for reticle fabrication

Kamikubo, Takashi, Abe, Takayuki, Oogi, Susumu, Anze, Hirohito, Shimizu, Mitsuko, Itoh, Masamitsu, Nakasugi, Tetsuro, Iijima, Tomohiro, Hattori, Yoshiaki, Aizaki, Naoaki

Year:

1997

Language:

english

File:

PDF, 112 KB

english, 1997

27

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Exposure characteristics of character projection-type low-energy electron-beam direct writing system

Satoh, Takayuki, Lercel, Michael J., Inanami, Ryoichi, Kishimoto, Katsumi, Hirose, Keizo, Nakasugi, Tetsuro, Koshiba, Takeshi, Ota, Takumi

Year:

2007

Language:

english

File:

PDF, 665 KB

english, 2007

28

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Alignment method of low-energy electron-beam direct writing system EBIS using voltage contrast image

Koshiba, Takeshi, Lercel, Michael J., Ota, Takumi, Nakasugi, Tetsuro, Nakamura, Fumihiko, Watanabe, Katsuhide, Sugihara, Kazuyoshi

Year:

2007

Language:

english

File:

PDF, 1.09 MB

english, 2007

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Nanoimprint lithography for semiconductor devices and future patterning innovation

Higashiki, Tatsuhiko, Herr, Daniel J. C., Nakasugi, Tetsuro, Yoneda, Ikuo

Year:

2011

Language:

english

File:

PDF, 692 KB

english, 2011

30

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Maskless lithography: estimation of the number of shots for each layer in a logic device with character-projection-type low-energy electron-beam direct writing system

Engelstad, Roxann L., Inanami, Ryoichi, Magoshi, Shunko, Kousai, Shouhei, Ando, Atsushi, Nakasugi, Tetsuro, Mori, Ichiro, Sugihara, Kazuyoshi, Miura, Akira

Year:

2003

Language:

english

File:

PDF, 158 KB

english, 2003

31

A Development of Photoresist Material for Low Energy Electron Beam Lithography

Saito, Satoshi, Nakasugi, Tetsuro

Journal:

Journal of Photopolymer Science and Technology

Year:

2003

File:

PDF, 628 KB

2003

32

Development of High Resolution Molecular Resist Based on Tris((hydroxypheny)pheny)benzene

Yamada, Arisa, Hattori, Shigeki, Saito, Satoshi, Asakawa, Koji, Yoneda, Ikuo, Nakasugi, Tetsuro

Journal:

Journal of Photopolymer Science and Technology

Year:

2010

Language:

english

File:

PDF, 1.62 MB

english, 2010

33

High Performance Chemically Amplified Positive Electron-Beam Resist: Optimization of Base Additives for Environmental Stabilization.

SAITO, SATOSHI, KIHARA, NAOKO, NAITO, TAKUYA, NAKASE, MAKOTO, NAKASUGI, TETSURO, KATO, YOSHIMITSU

Journal:

Journal of Photopolymer Science and Technology

Year:

1996

Language:

english

File:

PDF, 386 KB

english, 1996

34

Overlay improvement in nanoimprint lithography for 1×-nm patterning

Fukuhara, Kazuya, Suzuki, Masato, Mitsuyasu, Masaki, Komukai, Toshiaki, Hatano, Masayuki, Kono, Takuya, Nakasugi, Tetsuro, Lim, Yonghyun, Jung, Wooyung, Nakamae, Koji

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2016

Language:

english

File:

PDF, 2.07 MB

english, 2016